2
orbit coupling, provided that the satellite-valley separa-
tion distance in momentum space is 4π/a, corresponding
to the condition λ= 1.57 nm.
From the outset, it is important to remark that the
spin-orbit coupling introduced by the Ge concentration
oscillations is fundamentally distinct from the spin-orbit
coupling of conventional Si/SiGe quantum wells. For a
given subband of a conventional Si/SiGe quantum well
immersed in a vertical electric field, the C2vpoint group
symmetry of the system allows for both Rashba and
“Dresselhaus-type” linear-kkterms of the form [20,21],
HSO =α(ky¯σx−kx¯σy) + β(kx¯σx−ky¯σy),(1)
where ¯σjare the Pauli matrices acting in (pseudo)spin
space and αand βare the Rashba and Dresselhaus coef-
ficients, respectively, of the subband. The presence of
Rasbha spin-orbit coupling is unsurprising due to the
structural asymmetry provided by the electric field [22],
while the presence of the Dresselhaus-type term is ini-
tially surprising since the diamond lattice of Si/SiGe
quantum wells possesses bulk inversion symmetry [23].
However, these systems still support a Dresselhaus-type
term of the same form β(kx¯σx−ky¯σy), due to the broken
inversion symmetry caused by the quantum well inter-
faces [20,21,24,25]. This is in stark contrast to the
true Dresselhaus spin-orbit coupling in III-V semicon-
ductors, where the asymmetry of the anion and cation
in the unit cell leads to bulk inversion asymmetry [23].
Importantly, we find in Sec. III B that the spin-orbit cou-
pling of the wiggle well does not rely upon the presence
of an interface. Rather, it is an intrinsic property of a
bulk system with Ge concentration oscillations. In this
sense, the spin-orbit coupling investigated here is more
akin to the true Dresselhaus spin-orbit coupling of III-
V semiconductors than the Dresselhaus-type spin-orbit
coupling of conventional Si/SiGe quantum wells brought
about by interfaces. Indeed, the only requirement for
linear-kkDresselhaus spin-orbit coupling in a wiggle well
with an appropriate λis confinement in the growth di-
rection (even symmetric confinement), to allow for the
formation of subbands. For simplicity in the remainder
of this work, we simply refer to this form of spin-orbit
coupling as Dresselhaus.
The rest of this paper is organized as follows. In Sec. II
we describe our model used to study the quantum well
heterostructure. Section III then presents our numerical
results for the spin-orbit coefficients. This also includes
the calculation of the EDSR Rabi frequency and studies
the impact of alloy disorder on the spin-orbit coefficients.
In Sec. IV we provide an extensive explanation of the
mechanism behind the spin-orbit coupling enhancement.
Finally, we conclude in Sec. V.
II. MODEL
In this section, we outline the model used to study
our Si/SiGe heterostructure along with the methods used
to calculate the spin-orbit coefficients. In Sec. II A, we
describe the tight binding model used to model generic
SiGe alloy systems. Next, in Sec. II B we employ a vir-
tual crystal approximation to impart translation invari-
ance in the plane of the quantum well, allowing us to
reduce the problem to an effective one-dimensional (1D)
Hamiltonian parametrized by in-plane momentum kk. In
Sec. II C, we expand the model around kk= 0 to separate
out the Hamiltonian components that give rise to Rashba
and Dresselhaus spin-orbit coupling, respectively, and we
explain the important differences between the two com-
ponents. Finally, in Sec. II D, we transform the Hamil-
tonian into the subband basis, which allows us to obtain
expressions for the Rashba and Dresselhaus spin-orbit
coefficients in each subband.
A. Model of SiGe alloys
To study the spin-orbit physics of our system we use
the empirical tight-binding method [26], where the elec-
tronic wave function is written as a linear combination
of atomic orbitals:
|ψi=X
n,j,ν,σ |njνσiψnjνσ .(2)
Here, hr|njνσi=φν(r−Rn,j )|σiis an atomic orbital
centered at position Rn,j , corresponding to atom jof
atomic layer nalong the growth direction [001],νis a
spatial orbital index, and |σiis a two component spinor
with σ=↑,↓indicating the spin of the orbital. We
use an sp3d5s*basis set with 20 orbitals per atom, on-
site spin-orbit coupling, nearest-neighbor hopping, and
strain. Note that nearest-neighbor sp3d5s*tight-binding
models are well established for accurately describing the
electronic structure of semiconductor materials over a
wide energy range [27]. Explicitly, νis a spatial orbital
index from the set including s,s∗,pi(i=x, y, z), and
di(i=xy, yz, zx, z2, x2−y2) orbitals, which are meant
to model the outer-shell orbitals of individual Si and
Ge atoms that participate in chemical bonding. Addi-
tionally, these orbitals possess certain spatial symmetries
that, combined with the diamond crystal structure of the
SiGe alloy, dictate the forms of the nearest neighbor cou-
plings, as first explained in the work of Slater and Koster
[26]. The free parameters of the tight-binding model (in-
cluding onsite orbital energies, nearest-neighbor hopping
energies, strain parameters, etc.) are then chosen such
that the band structure of the system agrees as well as
possible with experimental and/or ab initio data. In this
work, we use the tight binding model and parameters
of Ref. [28], which allows for the modeling of strained,
random SiGe alloys with any Ge concentration profile.
The Hamiltonian of an arbitrary SiGe alloy takes the