Spin-orbit enhancement in SiSiGe heterostructures with oscillating Ge concentration Benjamin D. Woods1M. A. Eriksson1Robert Joynt1and Mark Friesen1 1Department of Physics University of Wisconsin-Madison Madison Wisconsin 53706 USA

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Spin-orbit enhancement in Si/SiGe heterostructures with oscillating Ge concentration
Benjamin D. Woods,1M. A. Eriksson,1Robert Joynt,1and Mark Friesen1
1Department of Physics, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA
We show that Ge concentration oscillations within the quantum well region of a Si/SiGe het-
erostructure can significantly enhance the spin-orbit coupling of the low-energy conduction-band
valleys. Specifically, we find that for Ge oscillation wavelengths near λ= 1.57 nm with an aver-
age Ge concentration of ¯nGe = 5% in the quantum well region, a Dresselhaus spin-orbit coupling
is induced, at all physically relevant electric field strengths, which is over an order of magnitude
larger than what is found in conventional Si/SiGe heterostructures without Ge concentration oscil-
lations. This enhancement is caused by the Ge concentration oscillations producing wave-function
satellite peaks a distance 2πaway in momentum space from each valley, which then couple to
the opposite valley through Dresselhaus spin-orbit coupling. Our results indicate that the enhanced
spin-orbit coupling can enable fast spin manipulation within Si quantum dots using electric dipole
spin resonance in the absence of micromagnets. Indeed, our calculations yield a Rabi frequency
Rabi/B > 500 MHz/T near the optimal Ge oscillation wavelength λ= 1.57 nm.
I. INTRODUCTION
Following the seminal work of Loss and DiVincenzo
[1], quantum dots in semiconductors have emerged as a
leading candidate platform for quantum computation [2
5]. Gate-defined quantum dots in silicon [6,7] are par-
ticularly attractive due to their compatibility with the
microelectronics fabrication industry. Moreover, in con-
trast with GaAs, for which coherence times are limited
by unavoidable hyperfine interactions with nuclear spins
[8], isotropic enrichment dramatically suppresses these
interactions in Si, enabling long coherence times [9].
While recent progress in Si quantum dots has been
quite promising, many of the leading qubit architectures
rely on synthetic spin-orbit coupling arising from micro-
magnets [1013], leading to challenges for scaling up to
systems with many dots. An alternative approach is to
use intrinsic spin-orbit coupling for qubit manipulation,
for example, through the electric dipole spin resonance
(EDSR) mechanism [14,15]. While this possibility has
been considered for Ge and Si hole-spin qubits, where the
degeneracy of the p-orbital-dominated valence band leads
to strong spin-orbit coupling [16,17], the weak spin-orbit
coupling of the Si conduction band appears unfavorable
for electron-spin qubits.
In this work, we show how the spin-orbit coupling in
Si/SiGe quantum well heterostructures can be enhanced
by more than an order of magnitude by incorporating
Ge concentration oscillations inside the quantum well,
leading to the possibility of exploiting intrinsic spin-orbit
coupling in Si quantum dots for fast gate operations. Fig-
ure 1(a) shows a schematic of the system which consists of
a Si-dominated quantum well region sandwiched between
Si0.7Ge0.3barrier regions, where the growth direction is
taken along the [001] crystallographic axis. In contrast to
“conventional” Si/SiGe quantum wells, the quantum well
region contains a small amount of Ge with concentration
oscillations of wavelength λ, as shown in Fig. 1(b). For
comparison, Fig. 1(c) shows the Ge concentration pro-
file of a conventional Si/SiGe quantum well. Previous
FIG. 1. (a) Schematic of the Si/SiGe heterostructure consid-
ered here, consisting of a Si-dominated quantum well sand-
wiched between Si0.7Ge0.3 barrier regions. Note that the
growth direction is along the [001] crystallographic axis. (b)
Ge concentration profile along the growth (z) direction of a
wiggle well. Ge concentration oscillations of wavelength λin-
side of the quantum well region lead to spin-orbit coupling
enhancement for a proper choice of λ. (c) Ge concentration
profile of a “conventional” Si/SiGe quantum well, for compar-
ison.
works [18,19] have studied such a structure, which has
been named the wiggle well, and found that the periodic
Ge concentration leads to an enhancement of the valley
splitting. Here, we develop a theory of spin-orbit cou-
pling within such structures and show that the periodic
nature of the device, along with the underlying diamond
crystal structure and degeneracy of the Si zvalleys, also
gives rise to an enhancement in spin-orbit coupling. Im-
portantly, we find that the wavelength λmust satisfy a
resonance condition to give rise to this spin-orbit cou-
pling enhancement. As discussed in detail in Sec. IV,
this involves a two-step process that can be summarized
as follows. First, the periodic potential produced by
the Ge concentration oscillations produces wave-function
satellites a distance 2πaway in momentum space from
each valley. Then, a satellite of a given valley couples
strongly to the opposite valley through Dresselhaus spin-
arXiv:2210.01700v2 [cond-mat.mes-hall] 16 Jan 2023
2
orbit coupling, provided that the satellite-valley separa-
tion distance in momentum space is 4π/a, corresponding
to the condition λ= 1.57 nm.
From the outset, it is important to remark that the
spin-orbit coupling introduced by the Ge concentration
oscillations is fundamentally distinct from the spin-orbit
coupling of conventional Si/SiGe quantum wells. For a
given subband of a conventional Si/SiGe quantum well
immersed in a vertical electric field, the C2vpoint group
symmetry of the system allows for both Rashba and
“Dresselhaus-type” linear-kkterms of the form [20,21],
HSO =α(ky¯σxkx¯σy) + β(kx¯σxky¯σy),(1)
where ¯σjare the Pauli matrices acting in (pseudo)spin
space and αand βare the Rashba and Dresselhaus coef-
ficients, respectively, of the subband. The presence of
Rasbha spin-orbit coupling is unsurprising due to the
structural asymmetry provided by the electric field [22],
while the presence of the Dresselhaus-type term is ini-
tially surprising since the diamond lattice of Si/SiGe
quantum wells possesses bulk inversion symmetry [23].
However, these systems still support a Dresselhaus-type
term of the same form β(kx¯σxky¯σy), due to the broken
inversion symmetry caused by the quantum well inter-
faces [20,21,24,25]. This is in stark contrast to the
true Dresselhaus spin-orbit coupling in III-V semicon-
ductors, where the asymmetry of the anion and cation
in the unit cell leads to bulk inversion asymmetry [23].
Importantly, we find in Sec. III B that the spin-orbit cou-
pling of the wiggle well does not rely upon the presence
of an interface. Rather, it is an intrinsic property of a
bulk system with Ge concentration oscillations. In this
sense, the spin-orbit coupling investigated here is more
akin to the true Dresselhaus spin-orbit coupling of III-
V semiconductors than the Dresselhaus-type spin-orbit
coupling of conventional Si/SiGe quantum wells brought
about by interfaces. Indeed, the only requirement for
linear-kkDresselhaus spin-orbit coupling in a wiggle well
with an appropriate λis confinement in the growth di-
rection (even symmetric confinement), to allow for the
formation of subbands. For simplicity in the remainder
of this work, we simply refer to this form of spin-orbit
coupling as Dresselhaus.
The rest of this paper is organized as follows. In Sec. II
we describe our model used to study the quantum well
heterostructure. Section III then presents our numerical
results for the spin-orbit coefficients. This also includes
the calculation of the EDSR Rabi frequency and studies
the impact of alloy disorder on the spin-orbit coefficients.
In Sec. IV we provide an extensive explanation of the
mechanism behind the spin-orbit coupling enhancement.
Finally, we conclude in Sec. V.
II. MODEL
In this section, we outline the model used to study
our Si/SiGe heterostructure along with the methods used
to calculate the spin-orbit coefficients. In Sec. II A, we
describe the tight binding model used to model generic
SiGe alloy systems. Next, in Sec. II B we employ a vir-
tual crystal approximation to impart translation invari-
ance in the plane of the quantum well, allowing us to
reduce the problem to an effective one-dimensional (1D)
Hamiltonian parametrized by in-plane momentum kk. In
Sec. II C, we expand the model around kk= 0 to separate
out the Hamiltonian components that give rise to Rashba
and Dresselhaus spin-orbit coupling, respectively, and we
explain the important differences between the two com-
ponents. Finally, in Sec. II D, we transform the Hamil-
tonian into the subband basis, which allows us to obtain
expressions for the Rashba and Dresselhaus spin-orbit
coefficients in each subband.
A. Model of SiGe alloys
To study the spin-orbit physics of our system we use
the empirical tight-binding method [26], where the elec-
tronic wave function is written as a linear combination
of atomic orbitals:
|ψi=X
n,j,ν,σ |njνσiψnjνσ .(2)
Here, hr|njνσi=φν(rRn,j )|σiis an atomic orbital
centered at position Rn,j , corresponding to atom jof
atomic layer nalong the growth direction [001],νis a
spatial orbital index, and |σiis a two component spinor
with σ=,indicating the spin of the orbital. We
use an sp3d5s*basis set with 20 orbitals per atom, on-
site spin-orbit coupling, nearest-neighbor hopping, and
strain. Note that nearest-neighbor sp3d5s*tight-binding
models are well established for accurately describing the
electronic structure of semiconductor materials over a
wide energy range [27]. Explicitly, νis a spatial orbital
index from the set including s,s,pi(i=x, y, z), and
di(i=xy, yz, zx, z2, x2y2) orbitals, which are meant
to model the outer-shell orbitals of individual Si and
Ge atoms that participate in chemical bonding. Addi-
tionally, these orbitals possess certain spatial symmetries
that, combined with the diamond crystal structure of the
SiGe alloy, dictate the forms of the nearest neighbor cou-
plings, as first explained in the work of Slater and Koster
[26]. The free parameters of the tight-binding model (in-
cluding onsite orbital energies, nearest-neighbor hopping
energies, strain parameters, etc.) are then chosen such
that the band structure of the system agrees as well as
possible with experimental and/or ab initio data. In this
work, we use the tight binding model and parameters
of Ref. [28], which allows for the modeling of strained,
random SiGe alloys with any Ge concentration profile.
The Hamiltonian of an arbitrary SiGe alloy takes the
3
form,
Hmi,nj
µσ,νσ =δnj
mi hδνσ0
µσ ε(nj)
ν+Vn+δσ0
σC(nj)
µν +S(nj)
µσ,νσ0i
+δσ0
σδn+1
mT(n)
iµ,jν +δn1
mT(m)
iµ,jν ,(3)
where Hmi,nj
µσ,νσ0=hmiµσ|H|njνσ0iand δequals 1if its
subscripts match its superscripts and 0otherwise. The
first line in Eq. (3) contains intra-atomic terms, where
ε(nj)
νis the onsite energy of orbital ν, for atom jin
atomic layer n,Vnis the potential energy due to the ver-
tical electric field, C(nj)
µν accounts for onsite energy shifts
and couplings caused by strain, and S(nj)
µσ,νσ0accounts for
spin-orbit coupling. The matrix C(nj)
µν is determined by
the deformation of the lattice due to strain as detailed
in Ref. [28] and arises from changes in the onsite poten-
tial of the atom due to the displacement of its neighbors.
In addition, spin-orbit coupling S(nj)is an intra-atomic
coupling between porbitals [29] and is the only term in
Eq. (3) that does not conserve spin σ. (See Appendix B
for the explicit form of S(nj).) Note that the superscripts
(nj), which index the atoms, are needed here because the
intra-atomic terms depend on whether an atom is Si or
Ge, as well as the local strain environment. The second
line in Eq. (3) contains inter-atomic terms describing the
hopping between atoms on adjacent atomic layers, where
T(n)is the hopping matrix from atomic layer nto atomic
layer n+1. Nearly all elements of T(n)are zero, with non-
zero hoppings occurring only between nearest-neighbor
atoms. A non-zero hopping matrix element T(n)
iµ,jν then
depends on three things: (1) the orbital indices µand
ν, (2) the types of atoms involved, and (3) the direction
and magnitude of the vector Rn+1,i Rn,j connecting the
atoms. We then use the Slater-Koster table in Ref. [26]
along with the parameters of Ref. [28] to calculate T(n)
iµ,jν .
We note that strain affects the hopping elements by al-
tering the direction and length of the nearest-neighbor
vectors (i.e., the crystalline bonds) [28,30].
In this work, we let the Ge concentration vary be-
tween layers, as shown in Figs. 1(b) and 1(c), but as-
sume it to be uniform within a given layer. Note that
the large difference in Ge concentration between the bar-
rier and well regions results in a large conduction band
offset that traps electrons inside the quantum well. This
occurs naturally in the tight binding model of Eq. (3)
because ε(nj), C(nj), and T(n)
ij are different for Si and Ge
atoms. Finally, we point the reader to Appendix Afor a
description of the lattice constant dependence on strain.
B. Virtual crystal approximation and pseudospin
transformation
While the Hamiltonian in Eq. (3) provides an accurate
description of SiGe alloys, it lacks translation invariance
when alloy disorder is present. This makes the model
computationally expensive to solve, and it obscures the
physics of the spin-orbit enhancement coming from the
averaged effects of the inhomogeneous Ge concentration
profile. We therefore employ a virtual crystal approxima-
tion where the Hamiltonian matrix elements are replaced
by their value averaged over all alloy realizations. Specif-
ically, we define a virtual crystal Hamiltonian HVC with
elements (HVC)mi,nj
µσ,νσ0=DHmi,nj
µσ,νσ0E, where h. . . iindicates
an average over all possible alloy realizations. The Hamil-
tonian is then translation invariant within the plane of
the quantum well. In addition, it is useful to move be-
yond the original orbital basis, where the spin is well-
defined, to a pseudospin basis defined by
|nj¯ν¯σi=X
νσ |njνσiU(n)
νσ,¯ν¯σ,(4)
where ¯νare the hybridized orbital states, ¯σ=,are the
pseudospins, and U(n)is the transformation matrix for
layer n. Full details of this basis transformation can be
found in Appendix B. Here, we mention three important
features of Eq. (4). First, the basis transformation diag-
onalizes the onsite spin-orbit coupling, making the spin-
orbit physics more transparent. Second, the pseudospin
states represent linear combinations of orbitals including
both spin and spin . Third, the transformation matrix
U(n)can be shown to satisfy
U(n)=(U(0), n Zeven,
U(1), n Zodd.(5)
This alternating structure for the transformation matrix
is crucial to the results that follow, and results from the
presence of two sublattices in the diamond crystal struc-
ture of Si, as shown in Fig. 2(a).
Making use of the virtual crystal approximation, we
now convert our three-dimensional (3D) Hamiltonian
into an effective 1D Hamiltonian. To begin, we note that
the virtual crystal Hamiltonian takes the simplified form,
(HVC)mi,nj
¯µ¯σ,¯ν¯σ0=δnj ¯σ0
mi¯σhδ¯ν
¯µ¯ε(n)
¯ν+Vn+¯
C(n)
¯µ¯νi
+δn+1
m¯
T(n)
i¯µ¯σ,j ¯ν¯σ0+δn1
m¯
T(m)
i¯µ¯σ,j ¯ν¯σ0,(6)
where (HVC)mi,nj
¯µ¯σ,¯ν¯σ0=hmi¯µ¯σ|HVC|nj¯ν¯σ0i,¯ε(n)
¯νis the on-
site energy of pseudospin orbital ¯ν, and ¯
C(n)and ¯
T(n)
are the onsite strain and hopping matrices, respectively,
transformed into the pseudospin basis and averaged over
alloy realizations. Note that ¯ε(n)includes contributions
from diagonalizing the onsite spin-orbit coupling. Impor-
tantly, ¯ε(n)and ¯
C(n)maintain a dependence on the layer
index ndue to the non-uniform Ge concentration pro-
file. In contrast, the dependence of intra-atomic terms
on the intra-layer atom index jhas vanished due to the
virtual crystal approximation. Moreover, the translation
invariance of the virtual crystal approximation implies
that hopping matrix elements between any two layers
only depend upon the relative position of atoms, i.e.,
4
¯
T(n)
i¯µ¯σ,j ¯ν¯σ0=¯
T(n)
¯µ¯σ,¯ν¯σ0(Rn+1,i Rn,j ). We therefore intro-
duce in-plane momentum kkas a good quantum number
and Fourier transform our Hamiltonian. To do so, we
define the basis state
kkn¯ν¯σ=1
pNkX
j
eikk·Rnj |nj¯ν¯σi,(7)
where kk= (kx, ky)and Nkis the number of atoms
within each layer. The Hamiltonian has matrix elements
e
Hmn
¯µ¯σ,¯ν¯σ0(kk) = δn¯σ0
m¯σhδ¯ν
¯µ¯ε(n)
¯ν+Vn+¯
C(n)
¯µ¯νi
+δn+1
me
T(n)
¯µ¯σ,¯ν¯σ0kk+δn1
me
T(m)
¯µ¯σ,¯ν¯σ0kk,(8)
where e
Hmn
¯µ¯σ,¯ν¯σ0(kk) = kkm¯µ¯σHVCkkn¯ν¯σ0, and
e
T(n)
¯µ¯σ,¯ν¯σ0kkis the Fourier-transformed hopping matrix
given by
e
T(n)
¯µ¯σ,¯ν¯σ0kk=
2
X
l=1
eikk·r(n)
l¯
T(n)
¯µ¯σ,¯ν¯σ0(r(n)
l),(9)
where r(n)
lis a nearest-neighbor vector from a reference
atom in layer nto one of its nearest neighbors in layer
n+ 1. For a diamond lattice, each atom has only has
two such bonds, as indicated in Fig. 2(a). Note that
the Hamiltonian matrix elements vanish between states
with different momenta due to translational invariance.
Hence, we obtain an effective 1D Hamiltonian as a func-
tion of kk.
An important feature of the Fourier-transformed hop-
ping matrix e
T(n)(kk)is that it depends on the layer index
nfor two reasons. First, the inhomogeneous Ge concen-
tration along the growth axis causes the hopping param-
eters to change slightly from layer to layer. Second, and
more importantly, the diamond crystal structure is com-
posed of two interleaving face-centered-cubic sublattices
which each contribute an inequivalent atom to the prim-
itive unit cell. This is illustrated in Fig. 2(a) where the
atoms belonging to the two sublattices are colored red
and blue, respectively. Indeed, the atoms for nZeven
and nZodd belong to sublattice 1 and 2, respectively,
and have different nearest neighbor vectors. It is there-
fore useful to define
e
T(n)kk=(e
T(n)
+kk, n Zeven
e
T(n)
kk, n Zodd
(10)
as the hopping matrices for the two sublattices. We stress
that the dependence of e
T(n)
+(kk)and e
T(n)
(kk)on the
layer index nis due to the inhomogeneous Ge concentra-
tion profile, and that e
T(n)
+(kk)and e
T(n)
(kk)differ due
to the diamond crystal structure having two inequiva-
lent atoms in its primitive unit cell. We can therefore
visualize the system, for any given kk, as a 1D, multi-
orbital tight binding chain, as shown in Fig. 2(b), where
the hopping terms alternate in successive layers.
(a)z(b)
e
T(0)
+k
e
T(1)
k
e
T(2)
+k
e
T(3)
k
z
FIG. 2. (a) Diamond crystal structure of silicon. The dashed
lines outline the conventional unit cell of the face centered
cubic lattice. Both red and blue atoms are silicon but be-
long to different sublattices. Notice that the vectors connect-
ing an atom to its four nearest neighbors are fundamentally
different for the red and blue atoms, giving rise to the al-
ternating hopping structure shown in (b). (b) Effective 1D
tight-binding chain, with hopping matrix terms alternating
between
e
T(n)
+(kk)and
e
T(n)
(kk). Note that each site has 20
orbitals, and only the forward hopping terms are shown. On-
site and backward hopping terms are not shown. For a SiGe
alloy in the virtual crystal approximation, the two-sublattice
structure is retained, but the atoms are replaced by virtual
atoms, with averaged properties consistent with the Ge con-
centration of a given layer.
C. Expansion around kk= 0
Our goal is to understand the spin-orbit physics of low-
energy conduction band states near the Fermi level. In
strained Si/SiGe quantum wells, these derive from the
two degenerate valleys near the Z-point of the strained
Brillouin zone [31]. Therefore, the low-energy states have
small |kk|, and we can understand the spin-orbit physics
by expanding the Fourier-transformed hopping matrices
e
T(n)
±kkto linear order. We find that
e
T(n)
±(kk) = e
T(n)
0+e
T(n)
R(kk)±e
T(n)
D(kk) + O(k2
k),(11)
where e
T(n)
0is the hopping matrix for kk= 0, and e
T(n)
R
and e
T(n)
Dcontain the linear kkcorrections. These hop-
ping matrix components are found to be
e
T(n)
0= Ω(n)¯σ0,(12)
e
T(n)
R(kk)=Φ(n)(ky¯σxkx¯σy),(13)
e
T(n)
D(kk)=Φ(n)(kx¯σxky¯σy),(14)
where (n)and Φ(n)are real-valued 10 ×10 matrices,
and ¯σjare the Pauli matrices acting on pseudospin space,
with j= 0, x, y, z.
There are several features to remark on in Eqs. (12)-
(14). First, the momentum-spin structure of e
T(n)
Rand
e
T(n)
Dhave the familiar forms of Rasbha and Dresselhaus
spin-orbit coupling; hence, we apply the subscript labels
摘要:

Spin-orbitenhancementinSi/SiGeheterostructureswithoscillatingGeconcentrationBenjaminD.Woods,1M.A.Eriksson,1RobertJoynt,1andMarkFriesen11DepartmentofPhysics,UniversityofWisconsin-Madison,Madison,Wisconsin53706,USAWeshowthatGeconcentrationoscillationswithinthequantumwellregionofaSi/SiGehet-erostructur...

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Spin-orbit enhancement in SiSiGe heterostructures with oscillating Ge concentration Benjamin D. Woods1M. A. Eriksson1Robert Joynt1and Mark Friesen1 1Department of Physics University of Wisconsin-Madison Madison Wisconsin 53706 USA.pdf

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