
2
of QDs [36, 37, 41, 45, 48]. Unsupervised statistical
methods [52, 53] and deterministic algorithms [36, 49–
51] have also been used for double-QD tuning. ML also
proven useful for compensating for cross-capacitance in
devices [45], calibration of virtual gates in place of real
ones [45, 48] and in the analysis and parameter-extraction
from charge stability diagrams [48].
A vast majority of these approaches relied on experi-
mentally obtained data as input [38, 48] or intermediate
step in a feedback protocol [36, 37, 42, 49, 51, 52], which
required numerous measurements or involved readjust-
ments and recapturing procedures [36, 37, 42, 43, 49, 51–
53]. Although scarcity of experimental data has been
addressed in Refs [43, 44] with synthetic data, many ML
solutions for QD simulators suffer from crude theoretical
assumptions. This includes the Thomas-Fermi approxi-
mation for electron density [44, 54], the use of exponen-
tial fits to tunneling couplings [48] or constant interac-
tion model with weak coupling and absent barrier gates
[50], which limits their applicability to a wider range of
designs and materials. Another limitation of the opti-
mization techniques used in Refs [38, 45] is the need for
obtaining the gradients of gate voltages in the parameter
search, which may be prone to vanishing gradient prob-
lem [55]. The relationship between gate voltages and the
parameters of the resulting quantum simulator is further
complicated by the scarcity of the physical simulation
domain: the majority of the voltage combinations pro-
duce unphysical potentials. Thus, an automated first-
principle design of quantum simulators must be able to
recognize the physical subdomain of experimentally tun-
able parameters.
To address this problem, we propose a hybrid machine-
learning approach using a combination of support vector
machines (SVMs) and Bayesian optimization to identify
combinations of voltages that realize a desired Hubbard
model. SVM constrains the space of voltages by rejecting
voltage combinations producing potentials unsuitable for
tight-binding (TB) approximation. The target voltage
combinations are then identified by Bayesian optimiza-
tion (BO) in the constrained subdomain. We perform
BO of gate voltages to produce a double QD system with
tailored tunneling parameter tand on-site Hubbard en-
ergy U, using experimental gate lithography images as
input for realistic calculations of tand Uwith the linear
combination of harmonic orbitals method (LCHO) [56].
This approach allows us to predict tand Ufor variable
electrode design and with flexible material parameters
and custom heterostructures. Our BO procedure oper-
ates without gradients or input from experimental charge
stability diagrams, which are tedious to measure for large
systems. BO is also suitable for problems with multiple
local optima and noisy data. We also develop an itera-
tive, scalable SVM-BO approach for multiple-site arrays,
which is able to reach optimal solution by only optimis-
ing subsets of voltages at a time and uses only the two-
site SVM. We predict the optimal voltage combination
needed in experiment to prepare an on-demand double
QD Hubbard model within 1.5% error for model gates
and 6% for experimental gates, as well as for three-site
system with 10% error. This procedure can be combined
with existing methods of preparing a charged state within
quantum dots [36, 41–43, 46, 48, 49, 51, 52].
This paper is organized as follows: Section I describes
the numerical calculations of the electrostatic potentials
from the metallic gate input image by solving Poisson’s
equation. Section II presents the SVM model developed
to classify voltage combinations and demonstrates its ex-
cellent performance for rejecting undesired voltage com-
binations for two gate designs: an ideal simple-shaped
gate set and a realistic experimental gate set obtained
from lithography images. Section III describes the LCHO
method for the calculation of the Hubbard model param-
eters and presents the results for possible U/t ratios that
can be achieved with various gate designs. The adapta-
tion of BO for the title problem is described in Section IV.
We present our results on optimal voltage combinations
for the model and experimental sets of gates in Section
V.
II. ELECTROSTATIC POTENTIAL FROM
METALLIC GATES
We begin by computing the electrostatic confining po-
tential produced by two sets of metallic gates: the model
basic-shape gates in Fig. 1 and a realistic gate image
from experiment [57] in Fig. 1. Both sets of metallic
gates are assumed to be 10 nm tall and are placed within
a heterostructure inside a material with = 10 (Fig. 1).
The pattern of the gates serves as input to a finite differ-
ence numerical method solving the Poisson’s equation:
∇ · (r)∇V(r)=−ρ(r)
0
,(1)
where r= (x, y, z)is the position vector in 3D space, ρ
is the charge density, (r)is the dielectric constant and
0is the permittivity of free space.
We use finite difference method with the varied dielec-
tric constant and two types of boundary conditions: the
Dirichlet boundary condition at the top and bottom of
computational box as well as inside the box, where the
gate is placed, the Neumann boundary condition at the
sides of the computational box, in xand ydirection. We
use a grid of 150×150×127 points in x×y×zdirections.
The sample is modeled with 30nm of vaccum above the
heterostructure and 30nm wetting layer below the metal-
lic gate layer. The successive over-relaxation technique
[58] is used to speed up the numerical procedure.
Fig 1 shows the resulting 2D electrostatic potential (for
experimental gates) for an sample set of voltages, consist-
ing of two confining wells (quantum dots) which act as
sites in a 2-site Hubbard model. The red line marks a 1D
cut of the potential passing through the minima of the
two wells. The 1D example potential cuts for model as
well as experimental gates are shown in Fig. 1.